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venerdì 5 ottobre 2012
Si(100) Etching in Aqueous Fluoride Solutions: Parallel Etching Reactions Lead to pH-Dependent Nanohillock Formation or Atomically Flat Surfaces - The Journal of Physical Chemistry C (ACS Publications)
Si(100) Etching in Aqueous Fluoride Solutions: Parallel Etching Reactions Lead to pH-Dependent Nanohillock Formation or Atomically Flat Surfaces - The Journal of Physical Chemistry C (ACS Publications)
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