Idrogeno
venerdì 5 ottobre 2012
Si(100) Etching in Aqueous Fluoride Solutions: Parallel Etching Reactions Lead to pH-Dependent Nanohillock Formation or Atomically Flat Surfaces - The Journal of Physical Chemistry C (ACS Publications)
Si(100) Etching in Aqueous Fluoride Solutions: Parallel Etching Reactions Lead to pH-Dependent Nanohillock Formation or Atomically Flat Surfaces - The Journal of Physical Chemistry C (ACS Publications)
Nessun commento:
Posta un commento
Post più recente
Post più vecchio
Home page
Iscriviti a:
Commenti sul post (Atom)
Nessun commento:
Posta un commento